HAFNIUM SPUTTERING TARGET
Hafnium Sputtering Target
Hafnium (Hf) is a lustrous silver grey, a ductile transition metal. The Hafnium metal is further purified to crystal bars using the van Arkel/de Boer iodine process. Hafnium resists corrosion in the air due to an oxide film's formation, although powdered hafnium burns in the air. Hafnium thin film coating can also be used to provide surface hardness and protection. We produces Hafnium sputtering targets with the highest quality refined crystal bars ensuring high purity, low zirconium content, and high reliability.
Hafnium Sputtering Target Properties
|
Chemical Formula |
Hf |
|
Atomic Weight |
178.49 |
|
Color/ Appearance |
Gray steel, metallic |
|
Melting Point |
2227℃ |
|
Thermal Conductivity |
23 W/m.K |
|
Coefficient of Thermal Expansion |
5.9 x 10-6/K |
|
Theoretical Density (g/cc) |
13.31 |
|
Z Ration |
0.36 |
|
Sputter |
DC |
|
Max Powder Density (Watts/Square Inch) |
50 |
|
Type of Bond |
Indium, elastomer |
Hafnium Sputtering Target Specifications
|
Description |
Typical Purity |
Size |
Shape |
|
Hafnium Sputtering Targets |
Hf + Zr>99.99%, |
Circular: Diameter < 14inch, Thickness > 1mm; |
Disc, plate |
|
Zr<0.2%, 0.3%&0.5% |
Block: Length < 32inch, Width < 12inch, Thickness > 1mm |
Column, step, custom-made |
Hafnium Sputtering Target Applications
1. Used in deposition processes, including semiconductor deposition, chemical vapor deposition (CVD), and physical vapor deposition (PVD).
2. Used for optics, including wear protection, decorative coatings, and displays.
