Niobium Sputtering Target
Purity: Nb>99.9%, 99.95%, 99.99%, 99.995%
Standard: ASTM B393-05
Density: >8.3g/cc
Recrystallization: >95%
Surface Roughness: Ra 0.8-1.6
Flatness: 0.1mm or 0.1%
We provides niobium target with uniform, high-density microstructure, and controlled texture, promoting uniform sputtering rates and generally superior sputtering behavior.
Chemical Composition of Niobium Sputtering Target
Grade |
Chemical Composition, Max |
Fe |
Si |
Mo |
W |
Ti |
Cr |
Ta |
Ni |
O |
C |
H |
N |
Nb+Ta≥% |
Nb3 |
20 |
20 |
80 |
100 |
10 |
10 |
1000 |
20 |
250 |
100 |
15 |
150 |
99.9 |
Nb2 |
10 |
10 |
50 |
50 |
5 |
5 |
500 |
10 |
200 |
50 |
10 |
100 |
99.95 |
Nb1 |
5 |
5 |
10 |
20 |
1 |
1 |
100 |
1 |
100 |
30 |
10 |
50 |
99.99 |
Niobium Sputtering Target Specifications
We can supply 8″, 12″ niobium round shape sputtering target. The largest disc target that we can provide is with 29” diameter. Below are most of the standard sizes for our tantalum rectangle sputtering targets. If you do not see the size that you need, please feel free to contact us.
Sizes/Tolerance(mm.max)
Thickness |
Tolerance |
Width |
Tolerance |
Length |
Tolerance |
GradeⅠ |
GradeⅡ |
3-8 |
±0.1 |
±0.2 |
50-400 |
±0.2 |
50-1800 |
±0.2 |
8-14 |
±0.1 |
±0.2 |
50-350 |
±0.2 |
50-1500 |
±0.2 |
≥14 |
±0.1 |
±0.2 |
50-300 |
±0.2 |
50-1200 |
±0.2 |
Sizes/Tolerance(mm.max)
Thickness |
Tolerance |
Diameter |
Diameter Tolerance |
GradeⅠ |
GradeⅡ |
3-8 |
±0.1 |
±0.2 |
50-450 |
±0.2 |
8-14 |
±0.1 |
±0.2 |
50-450 |
±0.2 |
≥14 |
±0.1 |
±0.2 |
50-400 |
±0.2 |