Tantalum Sputtering Target
Purity: Ta>99.95%, 99.99%, 99.995%, 99.999%
Standard: ASTM B708-05
Density: >16.1g/cc
we provides a tantalum target with uniform, high-density microstructure, and controlled texture, promoting uniform sputtering rates and generally superior sputtering behavior.
Chemical Composition of Tantalum Sputtering Target
|
Grade |
Chemical Composition, Max |
|
Fe |
Si |
Mo |
W |
Ti |
Cr |
Nb |
Ni |
O |
C |
H |
N |
ta≥% |
|
Ta3 |
10 |
20 |
50 |
100 |
10 |
20 |
300 |
10 |
150 |
100 |
30 |
100 |
99.95 |
|
Ta2 |
3 |
10 |
10 |
50 |
2 |
10 |
50 |
2 |
120 |
80 |
20 |
80 |
99.99 |
|
Ta1 |
1 |
0.08 |
10 |
20 |
0.8 |
0.5 |
20 |
0.1 |
100 |
50 |
15 |
50 |
99.995 |
Tantalum Sputtering Target Specifications
We can supply 8″, 12″ tantalum round shape sputtering target. The largest disc target that we can provide is with 29” diameter. Below are most of the standard sizes for our tantalum rectangle sputtering targets. If you do not find the size you need, please feel free to contact us.
Sizes/Tolerance(mm.max)
|
Thickness |
Tolerance |
Width |
Tolerance |
Length |
Tolerance |
|
GradeⅠ |
gradeⅡ |
|
3-8 |
±0.1 |
±0.2 |
50-400 |
±0.2 |
50-1500 |
±0.2 |
|
8-14 |
±0.1 |
±0.2 |
50-350 |
±0.2 |
50-1200 |
±0.2 |
|
≥14 |
±0.1 |
±0.2 |
50-300 |
±0.2 |
50-1000 |
±0.2 |
Recrystallization: >95%
Surface Roughness: Ra 0.8-1.6
Flatness: 0.1mm or 0.1%
