Tungsten Sputtering Target
Tungsten has the highest melting point (3422℃, 6192 ℉), lowest vapor pressure (at temperatures above 1650℃, 3000 ℉), and the highest tensile strength in all metals available in pure form. Although carbon remains solid at higher temperatures than tungsten, carbon sublimes at atmospheric pressure instead of melting, so it has no melting point. Tungsten has the lowest coefficient of thermal expansion of any pure metal. The low thermal expansion, high melting point, and tensile strength of tungsten originate from strong covalent bonds formed between tungsten atoms by the 5d electrons. Alloying small quantities of tungsten with steel greatly increases its toughness.
Tungsten Sputtering Target Properties
Purity: W>99.95%
Density: >19.1g/cc
Circular: Diameter <= 14inch, Thickness >= 1mm
Block: Length <= 32inch, Width <= 12inch, Thickness >= 1mm
Types: Planar & rotary tungsten sputtering targets
Tungsten Sputtering Target Applications
Tungsten sputtering target can be applied in the vacuum coating industry, X-ray tube, ion sputtering, flat panel display industry, and photovoltaic industry. Tungsten sputtering target can be used as a thin-film solar cell electrode, wiring material, and barrier layer material of semiconductor.
Tungsten Sputtering Target Specifications
Below are most of the standard sizes for our tungsten sputtering targets. If you do not find the size you need, please feel free to contact us.
|
Thickness |
Width |
Length |
Parallelism |
Verticality |
Surface Finish |
|
8.0~16.0 |
10~450 |
10~500 |
<0.05 |
<2o |
<Ra0.8 |
|
3.0~8.0 |
10~450 |
10~800 |
<0.05 |
<2o |
<Ra0.8 |
|
1.0~3.0 |
10~450 |
10~1200 |
<0.05 |
<2o |
<Ra0.8 |
