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VANADIUM CARBIDE SPUTTERING TARGET

VANADIUM CARBIDE SPUTTERING TARGET(图1)

Vanadium Carbide Sputtering Target

Vanadium carbide is the inorganic compound with the formula VC. It is a tough refractory ceramic material. With a hardness of 9-9.5 Mohs, it is possibly the hardest known metal-carbide. It is of interest because it is common in vanadium metal and alloys. Vanadium carbide has an elastic modulus of approximately 380 GPa. Vanadium carbide (VC) thin films were deposited on silicon substrates by direct sputtering of a VC target in an argon atmosphere.

Vanadium Carbide Sputtering Target Properties

Material Vanadium Carbide
Chemical Formula VC
Color/ Appearance Dark grey
Melting Point 2810℃
Theoretical Density (g/cc) 5.77
Z Ration 1
Sputter RF
Type of Bond  Indium, Elastomer

Vanadium Carbide Sputtering Target Specifications

Purity: 99.5%
Size: Circular: Diameter <= 14inch, Thickness >= 1mm
Block: Length <= 32inch, Width <= 12inch, Thickness >= 1mm

Vanadium Carbide Sputtering Target Applications

1. Semiconductor chemical
2. Vapor deposition (CVD) and physical vapor deposition (PVD) display
3. Optical applications

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