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VANADIUM SPUTTERING TARGET

VANADIUM SPUTTERING TARGET(图1)VANADIUM SPUTTERING TARGET(图2)VANADIUM SPUTTERING TARGET(图3)


Vanadium Sputtering Target Process

Thanks to the special forming processes we use, the sputtering targets' actual density almost reaches 100%. Our customers benefit from a faster process due to higher sputtering speeds. Our production process for Vanadium sputtering target are:


VANADIUM SPUTTERING TARGET(图4)

Vanadium Sputtering Target Properties


Material Vanadium
Chemical Formula V
Atomic Weight 50.9415
Color/ Appearance Silvery Gray, Metallic
Melting Point 1890℃
Thermal Conductivity 23 W/m.K
Coefficient of Thermal Expansion 8.4 x 10-6/K
Theoretical Density (g/cc) 5.96
Z Ration 0.53
Sputter DC
Max Powder Density (Watts/Square Inch) 50
Type of Bond  Indium, Elastomer

Micrograph of Vanadium Sputtering Target

Our production process's flexibility allows adjusting the microstructure of our coating material to achieve the desired effect. If the sputtering target grains are uniformly aligned, the user can benefit from constant erosion rates and homogeneous layers.

Vanadium Sputtering Target Specifications

Purity 99.5%, 99.9%
Shape Disc targets, plate targets, column targets, step targets, custom-made
Size Circular: Diameter < 14inch, Thickness > 1mm;  Block: Length < 32inch, Width < 12inch, Thickness > 1mm

Chemical Composition of Vanadium Sputtering Target

The sputtering targets we produced are of high purity. The most important benefits are that the films possess an outstanding electrical conductivity level and minimized particle formation during the PVD process. Below form is a formal certificate of analysis for the 3N high purity Vanadium sputtering target.

 
Analytical methods:
1. Metallic elements are analyzed using ICP-OES.

2. Gas elements are analyzed using LECO.

Element Actual Units Element Actual Units
Na   ppm Ni   ppm
Mg <20 ppm Cu <100 ppm
Al <20 ppm Zn <50 ppm
Si   ppm As <20 ppm
P   ppm Zr <20 ppm
K <10 ppm Mo <50 ppm
Ca <10 ppm Cd <20 ppm
Ti   ppm Sn <20 ppm
V Matrix ppm Sb <20 ppm
Cr <50 ppm Ta <50 ppm
Mn <50 ppm W <50 ppm
Fe <100 ppm Pb <20 ppm
Co <100 ppm Bi <20 ppm
Se   ppm Tl <10 ppm
O <20 ppm C <20 ppm
N <20 ppm H   ppm
S <20        

 

Vanadium Sputtering Target Applications

1. Used in semiconductor, chemical vapor deposition (CVD), physical vapor deposition (PVD) display, and optical applications.

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